| ID | Category | Equipment | Manufacturer | Model | Size |
| W111003009 | DEPOSITION | SPUTTER | ANELVA | ILC1060 | 6 |
| W111003010 | DEPOSITION | SPUTTER | AMAT | Endura | 8 |
| W111003028 | LITHOGRAPHY | STEPPER | NIKON | i12 | |
| W111003029 | DEPOSITION | EVAPORATOR | ULVAC | EBX2000 | |
| W111003030 | METROLOGY | CDSEM | HITACHI | S6200H | |
| W111006001 | IMPLANTER | VARIAN | Vision200 | ||
| W111006002 | IMPLANTER | VARIAN | Vision80 | ||
| W111011005 | LITHOGRAPHY | SCANNER | NIKON | S206D | |
| W111011006 | LITHOGRAPHY | COATER_DEVELOPER | TEL | ACT8-2 | |
| W111011007 | IMPLANTER | MIDDLE_CURRENT_I/I | EATON_NOVA | MC3-MarkⅡ | |
| W111011008 | IMPLANTER | MIDDLE_CURRENT_I/I | NISSHIN | EXCEED3000 | |
| W111011011 | IMPLANTER | HIGH_CURRENT_I/I | AMAT | Quantum Leap | |
| W111011014 | ETCHER | ETCHER | TEL | Unity SCCM | |
| W111011016 | DEPOSITION | SPUTTER | ANELVA | 1060 | |
| W111012002 | METROLOGY | DEFECT_INSPECTION | RUDOLPH(TEL) | NSX115 | 8 |
| W111024002 | DEPOSITION | APCVD | WATKINS_JOHNSON | WJ-999R | 6 |
| W111024006 | CLEAN | SCRUBBER | DNS | SS3100 | 12 |
| W111024007 | DIFFUSION | LPCVD | AMAT | FORMULA | 12 |
| W111024008 | IMPLANTER | HIGH_ENERGY_I/I | EATON_NOVA | NV-GSD-HE3 | 12 |
| W111024009 | ETCHER | METAL_ETCHER | AMAT | Centura DPSII | 12 |
| W111024010 | DIFFUSION | FURNACE | KEM | DD1206V | 12 |
| W111024013 | ETCHER | ASHER | KEM | λ300 | 12 |
| W111026002 | DEPOSITION | AMAYA | AMAX800 | ||
| W111028001 | METROLOGY | CONTAMINATION_CHECKER | HITACHI | IS2510 | |
| W111102001 | IMPLANTER | HIGH_ENERGY_I/I | 4 | ||
| W111107001 | METROLOGY | FILM_THICKNESS_MEASUREMENT | |||
| W111115002 | DIFFUSION | FURNACE | TEL | Alpha 8S | |
| W111115003 | DEPOSITION | HDPCVD | AMAT | Ultima TE | |
| W120201001 | IMPLANTER | MIDDLE_CURRENT_I/I | NISSHIN | EXCEED2000AH | |
| W120201002 | IMPLANTER | HIGH_CURRENT_I/I | AXCELIS | NV-GSDⅢ‐180 | |
| W120201003 | METROLOGY | ION_DOZE_MEASUREMENT | THERMAWAVE | TP-600 | |
